New PDF release: Alternative Lithography: Unleashing the Potentials of

By Clivia M. Sotomayor Torres (auth.), Clivia M. Sotomayor Torres (eds.)

ISBN-10: 1441992049

ISBN-13: 9781441992048

ISBN-10: 1461348366

ISBN-13: 9781461348368

Good outdated Gutenberg couldn't have imagined that his innovative printing notion which so drastically contributed to dissemination of information and hence at the present time 's wealth, may were a resource of suggestion years later. Now, it kind of feels intuitive basic method to produce loads of replicates is utilizing a mildew to emboss trend you wish, yet on the nanoscale not anything is easy: the satan is within the element. And this e-book is ready the "devil". within the following 17 chapters, the authors-all of them good famous and lively actors during this rising field-describe the state of the art, this day 's technological bottlenecks and the customers for micro-contact printing and nanoimprint lithography. Many result of this publication originate from initiatives funded via the ecu Com­ venture via its "Nanotechnology details units" (NID) initiative. NID used to be introduced with the target to advance nanoscale units for the time whilst the purple­ brick situation of the ITRS roadmap will be reached. It grew to become quickly transparent besides the fact that, that there has been no aspect to enquire basically replacement units to CMOS, yet what was once fairly wanted used to be an built-in technique that took into consideration extra elements of this tough project. Technologically talking , this intended to have a coherent technique to advance novel units, nanofabrication instruments and circuit & process architectures on the comparable time.

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Extra info for Alternative Lithography: Unleashing the Potentials of Nanotechnology

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N. Boto, P. Kok, D. S. Abrams, S. L. Braunstein, C. P. Williams and J. P. Dowling, Phus Rev Lett 85 2733 (2000) 40. M. Muetzel , S. Tandelr, D. Haubrich , D. Meschede, K. Peithmann , M. Flaspoehler and K. Buse, Phys Rev Lett 88, article no 083601-1093601-3 (2002). 9. 10. II. 12. 14 CHAPTER 1 41. J. Brugger, 1. W. Berenschot, S. Kuiper, W. Nijdam,B. Otter and M. Elwenspoek, Microelectronic Engineering53 403 (2000) 42. D. Pinner, J. Zhu, F. Xu and S. Hong, Science 283, 661 (1999) 43. S. Hong and C.

Finder, M. Beck, J. Seekamp, K. Pfeiffer, P. Carlberg , I. Maximov, F. -L. Sarwe, S. Zankovych, J. Ahopelto , L. Montelius, C. Mayer and C. M. Sotomayor Torres. To appear in Microelectronic Engineering 22. K. Pfeiffer, F. Reuther, M. Fink, G. Gruetzner, N. Roos, H. -C. Scheer, J. Seekamp, S. Zankovych , C. M. Sotomayor Torres, I. Maximov, L. Montelius and Ch. Cardinaud . To appear in Microelectronic Engineering. 23. W. Zhang and S. P. Chou, Appl Phys Lett 79 845 (2001) . 24. S. Zankovych, T. Hoffmann , J.

Depending on the thickness of the initial layer and the temperature speeds larger than 10-9 nm S-1 are achieved, which would lead to embossing times of less than 100 s for an imprint depth of 100 nm. 7. Scanning electron micrographies of 100 nm thick imprinted alpha sexithiophen (T6) on silicon substrate in different geometric arrays. Magnified details of SEM micrograph of Figure 4. 1. Computedmotion of mould and substrate (2dhldt) for an applied pressure of 107 Pa, different viscosityof PMMA and two differentinitial fluid thicknesses (2h o).

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Alternative Lithography: Unleashing the Potentials of Nanotechnology by Clivia M. Sotomayor Torres (auth.), Clivia M. Sotomayor Torres (eds.)


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